Extreme Ultraviolet (EUV) Flat Mirrors for 13,5 nm available for immediate delivery

Maximum achievable reflection at 13,5 nm

Extreme Ultraviolet (EUV) Flat Mirrors are available in 5° and 45° AOI versions and feature nearly ideal reflectivity at 13,5 nm, the wavelength of highest reflectivity available in the EUV spectrum. The RoHS compliant mirrors offer a coating deposited on a super-polished single crystal silicon substrate for superior thermal stability. Exhibiting a surface roughness less than 3Å RMS, these EUV mirrors greatly reduce scatter of incident light. The multi-layer, metal/semi-conductor coating includes a Mo/Si multilayer with a Si top layer. With a surface flatness of λ/10 at 632,8 nm and 6,35 mm thickness, the 45° AOI mirrors are ideal for steering s-polarized beams, while the 5° AOI mirrors are excellent for use with unpolarized beams.

Ideal for CDI and materials science research

Extreme Ultraviolet (EUV) Flat Mirrors are used for emerging applications such as Coherent Diffractive Imaging (CDI) and materials science research. CDI is a non-contact imaging technique, capable of achieving resolutions approaching 10 nm and is commonly used to analyze extremely small nanofabricated structures. The mirrors are also used as harmonic selectors for High Harmonic Generation (HHG) beams. Extreme Ultraviolet (EUV) Flat Mirrors are in-stock and available for immediate delivery.